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Compact RF Plasma Cleaner

PLUTO-T Compact RF Plasma Cleaner

A compact 200 W RF plasma cleaner for single-sample cleaning, surface activation, and small-lab entry into plasma processing.

Configuration

$9,999

PLUTO-T compact RF plasma cleaner

Chamber

~4.3 L

RF Power

200 W

Frequency

13.56 MHz

Control

Touchscreen

Single-Sample Plasma Processing

High power density RF cleaning in a benchtop footprint.

PLUTO-T pairs a 200 W RF source with a compact ~4.3L stainless steel chamber, giving small labs precise, repeatable plasma cleaning without a full-size system.

Cleaning

Remove organic residue before bonding, coating, or analysis.

O2 / N2 / Ar1 W power precision

Activation

Raise surface energy for adhesion, wetting, and PDMS bonding.

PolymersGlassMetals

Small-Lab Entry

Touchscreen automation makes plasma processing approachable for new users.

Fully automated runsBenchtop format

Use Cases

Built for compact single-sample plasma workflows.

Compare HY-4L

Sample Cleaning

Prepare individual substrates and samples with adjustable 0-200 W RF power.

Surface Activation

Activate surfaces before bonding, coating, or microfluidic assembly.

Teaching and Prototyping

A compact automated platform for teaching labs and early process development.

Specifications

PLUTO-T configuration window

Representative PLUTO-T configuration from the equipment summary and legacy datasheet table. Confirm process-specific requirements during quote review.

Chamber
~4.3 L stainless steel
Chamber Size
φ150 mm x 245 mm depth
RF Power
0-200 W, 1 W precision
Frequency
13.56 MHz, auto-impedance matching
Electrode
95 x 170 mm flat plate
Gas Lines
1 standard, optional 2nd (O2 / N2 / Ar)
Control
4.3 in touchscreen, fully automated
System Size
380 x 500 x 490 mm

Applications

Where PLUTO-T fits

Single-sample cleaning

Surface activation

PDMS and microfluidic bonding

SEM sample preparation

Teaching labs

Process prototyping

System Views

System Views

Use these actual system photos to review the chamber interior, electrode format, sample handling, and benchtop footprint before configuration review.

PLUTO-T chamber interior with flat plate electrode
Chamber interior
PLUTO-T sample tray with wafer during plasma processing
Sample processing
PLUTO-T complete system with vacuum pump
Complete system

FAQ

Frequently Asked Questions

How is PLUTO-T different from HY-4L?

PLUTO-T is an RF-only 200 W compact cleaner with 1 W power precision and touchscreen automation, sized for single-sample workflows. HY-4L offers RF or mid-frequency options in a 4L chamber format. See the PLUTO vs HY comparison guide for a full breakdown.

Can PLUTO-T be purchased directly?

Yes. PLUTO-T can be ordered directly, and institutional buyers can also request a budgetary quote for PO-based purchasing.

Ready to Configure

Choose PLUTO-T for compact RF plasma processing.

Order directly or request a budgetary quote for institutional purchasing.