Cleaning
Remove organic residue before bonding, coating, or analysis.
Compact RF Plasma Cleaner
A compact 200 W RF plasma cleaner for single-sample cleaning, surface activation, and small-lab entry into plasma processing.

Chamber
~4.3 L
RF Power
200 W
Frequency
13.56 MHz
Control
Touchscreen
Single-Sample Plasma Processing
PLUTO-T pairs a 200 W RF source with a compact ~4.3L stainless steel chamber, giving small labs precise, repeatable plasma cleaning without a full-size system.
Remove organic residue before bonding, coating, or analysis.
Raise surface energy for adhesion, wetting, and PDMS bonding.
Touchscreen automation makes plasma processing approachable for new users.
Use Cases
Prepare individual substrates and samples with adjustable 0-200 W RF power.
Activate surfaces before bonding, coating, or microfluidic assembly.
A compact automated platform for teaching labs and early process development.
Specifications
Representative PLUTO-T configuration from the equipment summary and legacy datasheet table. Confirm process-specific requirements during quote review.
Applications
Single-sample cleaning
Surface activation
PDMS and microfluidic bonding
SEM sample preparation
Teaching labs
Process prototyping
System Views
Use these actual system photos to review the chamber interior, electrode format, sample handling, and benchtop footprint before configuration review.



Resources
FAQ
PLUTO-T is an RF-only 200 W compact cleaner with 1 W power precision and touchscreen automation, sized for single-sample workflows. HY-4L offers RF or mid-frequency options in a 4L chamber format. See the PLUTO vs HY comparison guide for a full breakdown.
Yes. PLUTO-T can be ordered directly, and institutional buyers can also request a budgetary quote for PO-based purchasing.
Ready to Configure
Order directly or request a budgetary quote for institutional purchasing.