Semiconductor
Etching, deposition, and plasma treatment for device R&D and pilot-line process modules.
Industrial Precision. Scientific Confidence.
Engineering Plasma Process Solutions
Semiconductor process equipment engineered for research and advanced manufacturing, including ICP-RIE, RIE, PECVD, ALD, sputtering, and thin-film processing systems.
Trusted by universities, national laboratories, and semiconductor innovators.
12+
Equipment Platforms
50+
Supported Processes
20+
Research Applications
2-Year
Standard Warranty
Process Capability
Start with the process, then choose the platform.
Engineers do not shop by catalog first. They look for a stable process window, compatible materials, and equipment that can reproduce the result.
View all processesCore process
Silicon Etching
High-aspect-ratio etch workflows for MEMS, TSV, and advanced device prototyping.
Core processThin Film Deposition
Conformal and plasma-enhanced films for dielectrics, barriers, passivation, and device stacks.
Active process map
Silicon Etching
Equipment
ICP-RIERIEDRIE
Applications
MEMSAdvanced PackagingFailure Analysis
Resources
Deep Silicon Bosch ProcessCompare ICP-RIE vs RIETSV
Applications
Built around the work researchers actually need to do.
Equipment Platforms
Choose the platform that matches the process window.
Platform
ICP-RIE
High-density plasma etching for demanding research processes.
Deep silicon etchingMEMS fabricationDiamond processing
Key Specifications
- Wafer Size
- 4-12 in
- Gas System
- 5 lines std.
- Stage Temp
- -70 to 200 C
- RF Power
- 1000-3000 W
Platform
RIE
Reliable anisotropic etching for universities and R&D labs.
Semiconductor R&DSurface activationDevice prototyping
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Platform
PECVD
Plasma-enhanced thin-film deposition for research stacks.
Dielectric filmsPassivationLow-temperature deposition
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Platform
ALD
Conformal atomic-layer films for precise device structures.
Barrier layers3D structuresAngstrom-scale films
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Platform
Sputter
Physical vapor deposition for metals and functional films.
MetallizationElectrodesThin-film stacks
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Platform
IBE/RIBE
Directional ion beam processing for precise material removal.
Failure analysisDevice trimmingLow-damage etching
View PlatformFeatured platforms shown above
Explore the full lineup, including E-Beam Evaporation, HDP-CVD, Coater/Developer, stripping, and plasma cleaner systems.
Research Validation
Peer-reviewed validation for the platforms we represent.
Independent labs at universities and research institutes have used the plasma, deposition, and vacuum process platforms we represent in their published work.
91 verified studies across the platforms we represent · and growing
ICP etching
ICP-100A
PhotoniX
Biomimetic sapphire windows enabled by inside-out femtosecond laser deep-scribing
2022 · Research using the ICP etching platform we represent.
View source ↗RIE etching
RIE-150A
Light: Science & Applications
On-chip nonlocal metasurface for color router: conquering efficiency-loss from spatial-multiplexing
2026 · Research using the RIE etching platform we represent.
View source ↗Magnetron sputtering
Sputter-100
Energy & Environmental Science
Microalloying induced stable welded interfaces for highly reversible zero-excess sodium metal batteries
2024 · Research using the magnetron sputtering platform we represent.
View source ↗RIE etching
RIE 100
Nature Communications
Near-ideal van der Waals rectifiers based on all-two-dimensional Schottky junctions
2021 · Research using the RIE etching platform we represent.
View source ↗Knowledge Center
Process notes for engineers who need a faster first decision.
Designed & Supported in the USA
Engineering-first Design
Two-Year Standard Warranty
Global Research Customers
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Let’s Build Your Next Process Together
Tell us your material stack, target process, and lab requirements. A NineScrolls engineer can help map the right platform and configuration.
2-Year Warranty
Global Support
Custom Configuration
Research Labs Worldwide