Batch Cleaning
Process multiple samples per run before bonding, coating, or analysis.
20 L chamberMulti-sample trays
Batch Plasma Cleaner
HY-20L Batch Plasma Processing System
A 20L RF/MF plasma cleaner for batch sample preparation, surface activation, and research-scale process development.
Configuration
$14,999
RF (13.56 MHz) configuration
Mid-Frequency (40 kHz) $11,999 · RF (13.56 MHz) $14,999
Chamber
20 L
Power
150 / 300 W
Options
RF / MF
Control
PLC
Batch Surface Preparation
20L plasma processing for multi-sample workflows.
HY-20L bridges compact plasma cleaning and higher-throughput batch preparation for research labs that need repeatable processing without an industrial platform.
Surface Activation
Improve surface energy for polymers, glass, metals, and device substrates.
RF optionMF option
Photoresist Ashing
Support oxygen plasma descum and batch organic residue removal.
Oxygen plasmaPLC recipes
Use Cases
Built for larger-batch plasma workflows.
Multi-Sample Preparation
Treat larger sample sets in a single run for research productivity.
Routine Activation
Prepare polymers, glass, and device substrates before bonding or coating.
Core Facility Workflows
Give shared labs a simple, documented plasma process platform.
Specifications
HY-20L configuration window
Representative HY-20L options. Confirm process-specific configuration during quote review.
- Chamber Volume
- 20 L
- RF Frequency
- 13.56 MHz
- MF Frequency
- 40 kHz
- Power
- 150 W RF / 300 W MF
- Gas Channels
- 2
- Control
- PLC + touchscreen
- Chamber
- 316 stainless steel
- Internal Size
- 250 x 250 x 320 mm
- Process Gases
- O2 / N2 / Ar
- Usable Load
- 242 x 250 x 45 mm
- Pump Speed
- 4.4 L/s
- Footprint
- 630 x 580 mm, 550 mm high
- Electrical
- 208–240 VAC, single-phase, 60 Hz
Applications
Where HY-20L fits
Batch plasma cleaning
Batch surface treatment
Surface activation
Bonding preparation
Multi-sample preparation
Shared research labs
Research evidence
Peer-reviewed research
System Views
System Views
Use these actual system photos to review the 20L enclosure, chamber access, front controls, and bench integration before configuration review.
FAQ
Frequently Asked Questions
Which HY-20L frequency should I choose?
RF is the default for research batch processing and surface activation. Mid-frequency is the lower-cost option for routine batch cleaning and robust surface treatment.
How is HY-20L different from HY-4L?
HY-20L increases chamber volume to 20 liters for multi-sample batch workflows while keeping the HY family PLC and touchscreen operating model.
Ready to Configure
Choose the HY-20L configuration for your batch workflow.
Order directly or request a budgetary quote for institutional purchasing.