Batch Cleaning
Process larger sample sets with a 20L stainless-steel chamber.
20 L chamber4-layer tray
Research Batch Plasma Cleaner
HY-20LRF Research-Grade Batch Plasma Cleaner
A 20L RF plasma cleaner for academic research teams that need documented, repeatable batch surface processing.
Configuration
$14,499
RF (13.56 MHz) configuration
Chamber
20 L
RF Power
300 W
Tray
4 layers
Control
PLC
Repeatable Batch Processing
20L RF plasma treatment for documented research workflows.
HY-20LRF is tuned for labs that need a higher-power RF batch cleaner with programmed automatic runs, multi-layer sample loading, and straightforward operation.
RF Activation
Use 13.56 MHz RF plasma for surface activation before bonding, coating, or analysis.
300 W RFO2 / N2 / Ar
Research Documentation
PLC touchscreen control supports repeatable runs for shared-lab workflows.
Auto / ManualDocumented process
Use Cases
Built for research-grade batch plasma workflows.
Core Facility Preparation
Support repeated plasma cleaning and activation across multi-user research workflows.
4-Layer Sample Loading
Use the included tray format for larger batches and organized sample handling.
RF-Only Repeatability
Standardize on one RF configuration when documented process consistency matters more than frequency flexibility.
Specifications
HY-20LRF configuration window
Representative HY-20LRF configuration. Confirm process-specific gas and power requirements during quote review.
- Chamber Volume
- 20 L
- RF Frequency
- 13.56 MHz
- RF Power
- 300 W
- Gas Lines
- 2
- Sample Tray
- 4 layers, 242 x 250 x 45 mm each
- Control
- PLC + touchscreen
- Chamber
- Stainless steel
- Ultimate Vacuum
- 0.1 Pa
- Internal Size
- 250 x 250 x 320 mm
- Process Gases
- O2 / N2 / Ar
- Pump Speed
- 4.4 L/s
- Footprint
- 630 x 580 mm, 810 mm high
- Electrical
- 208–240 VAC, single-phase, 60 Hz
Applications
Where HY-20LRF fits
Batch plasma cleaning
Surface activation
Bonding preparation
SEM sample preparation
Multi-sample processing
Core facility workflows
Research evidence
Peer-reviewed research
System Views
System Views
Use these actual system photos to review the 20L enclosure, front controls, service-side access, and bench integration before configuration review.
FAQ
Frequently Asked Questions
How is HY-20LRF different from HY-20L?
HY-20LRF focuses on a single higher-power RF configuration for documented, repeatable batch plasma processing. HY-20L offers RF and mid-frequency options for broader budget and process flexibility.
Can HY-20LRF be purchased directly?
Yes. HY-20LRF can be ordered directly, and institutional buyers can also request a budgetary quote for PO-based purchasing.
Ready to Configure
Choose HY-20LRF for documented RF batch processing.
Order directly or request a budgetary quote for institutional purchasing.