Multi-Shelf Batch Cleaning
Load up to 7 adjustable sample shelves for higher throughput cleaning and activation.
30 L chamberUp to 7 shelves30 mm electrode gap
Batch RF Plasma System
PLUTO-30 Batch RF Plasma System
A 30L vertical RF plasma system with up to 7 adjustable sample shelves, MFC gas control, and a 7 in touchscreen for repeatable batch cleaning, activation, and etching.
Chamber
30 L
RF Power
500 W
Shelves
Up to 7
Gas Control
MFC
Batch And Pilot-Scale Plasma
Digital gas control and multi-shelf batches in one system.
PLUTO-30 pairs a 500 W RF source and automatic matching network with a 30L vertical chamber, up to 7 adjustable shelves, and MFC-controlled gas. Recipes and permissions live on a 7 in touchscreen so shared teams get repeatable batch results.
MFC Gas Control
Digital mass-flow control (1 standard, up to 4) supports repeatable, tunable chemistry.
1-4 MFCsRecipe storageAuto / manual modes
Flexible Electrodes
Configurable electrodes and gas distribution enable fast changeover between products and processes.
CleaningActivationEtching
Use Cases
Built for higher-throughput batch and pilot plasma workflows.
R&D To Pilot Production
A vertical batch system that bridges lab development and small-batch production.
Surface Activation
Activation for adhesion, bonding, and coating preparation, up to 7 shelves per load.
Etching And Descum
Configurable electrodes and MFC gas for controlled etch and residue removal.
Specifications
PLUTO-30 configuration window
Representative PLUTO-30 configuration transcribed from the equipment summary. Confirm electrode, MFC, and gas configuration during quote review.
- Chamber
- 30 L, 300 x 366 x 280 mm (W x D x H)
- Sample Shelves
- Up to 7 adjustable
- Electrode Gap
- 30 mm
- Electrodes
- Power 226 x 210, ground 260 x 210 mm
- RF Power
- 500 W, 13.56 MHz auto-match
- Gas Control
- 1 MFC standard, up to 4
- Control
- 7 in touchscreen, recipe storage
- Vacuum
- Oil pump, 32 m3/h
- System Size
- 706 x 804 x 735 mm (W x D x H)
- Electrical
- 208–240 VAC, single-phase, 60 Hz
Applications
Where PLUTO-30 fits
Batch plasma cleaning
Surface activation
Plasma etching
Adhesion and bonding preparation
Pilot production
Core facility workflows
Research evidence
Peer-reviewed research
System Views
System Views
Actual PLUTO-30 system photos: the open chamber with adjustable shelves, the complete floor-standing unit, an installed cleanroom scene, and chamber dimensions.
FAQ
Frequently Asked Questions
How is PLUTO-30 different from the benchtop PLUTO cleaners?
PLUTO-30 steps up from the benchtop 4-14L cleaners to a 30L vertical chamber with up to 7 adjustable sample shelves, digital MFC gas control (1 standard, up to 4), and a 7 in touchscreen with recipe storage. It targets higher-throughput batch work and pilot production rather than single-sample lab use.
What processes does PLUTO-30 support?
PLUTO-30 handles plasma cleaning, surface activation, and etching. Flexible electrode configurations and MFC-controlled gas distribution let one system move quickly between products and recipes, run automatically or manually, and store validated process menus.
Can PLUTO-30 be purchased directly?
PLUTO-30 is configured per application and quoted directly. Share your samples, throughput, and gas chemistry and we will confirm the electrode and MFC configuration during quote review.
Request a Quote
Scale plasma processing to batch and pilot production with PLUTO-30.
Share your samples, throughput, and gas chemistry for an application-matched configuration.