Stacked-Pair Batch Cleaning
Each electrode pair takes one sample; a fully configured machine runs four per batch.
30 L chamber1-4 electrode pairs30 mm adjustable gap
Batch RF Plasma System
PLUTO-30 Batch RF Plasma System
A 30L floor-standing RF plasma system with one to four electrode pairs, two mass flow controllers, and a 7 in touchscreen for repeatable batch cleaning, activation, and surface treatment.
Chamber
30 L
RF Power
0-500 W
Electrode Pairs
1-4
Gas Control
2 MFCs
Batch And Pilot-Scale Plasma
Digital gas control and stacked electrode pairs in one system.
PLUTO-30 pairs a 0-500 W RF source and automatic matching network with a 30L floor-standing chamber, one to four electrode pairs, and two mass flow controllers. Recipes and permissions live on a 7 in touchscreen so shared teams get repeatable batch results.
MFC Gas Control
Two mass flow controllers (0-200 ml) plus CDA and vent lines support repeatable, tunable chemistry.
2 MFCs standardRecipe storageAuto / manual modes
Flexible Electrodes
Insert-rod 6061-T6 electrodes and tuned gas distribution enable fast changeover between products and processes.
CleaningActivationSurface modification
Use Cases
Built for higher-throughput batch and pilot plasma workflows.
R&D To Pilot Production
A floor-standing batch system that bridges lab development and small-batch production.
Surface Activation
Activation for adhesion, bonding, and coating preparation, up to four samples per load.
Descum And Light Etch
Timed, MFC-controlled recipes for residue removal and light etch work.
Specifications
PLUTO-30 configuration window
Review the PLUTO-30 capabilities for initial system selection. PLUTO-30 is a surface-treatment system for cleaning, activation, and surface modification — it is not a fluorine-based reactive ion etcher. Process control is timed; endpoint detection is not included and the electrode shelves are unheated. Confirm electrode-pair count, gas lines, and pump selection during quote review.
- Chamber
- 30 L, 300 x 366 x 280 mm (W x D x H)
- Chamber Material
- Leak-tested 316 stainless steel
- Electrodes
- Powered and ground 226 x 210 mm, insert-rod 6061-T6 aluminum
- Electrode Configuration
- One pair standard, expandable to four pairs
- Batch Capacity
- One sample per electrode pair, up to 4 per run
- Electrode Gap
- 30 mm, adjustable
- RF Power
- 0-500 W continuously adjustable, 1 W resolution
- Frequency
- 13.56 MHz, automatic impedance matching
- Gas Control
- 2 MFCs standard (0-200 ml), plus CDA and vent lines
- Vacuum Control
- Pirani sensor, 1% accuracy, full safety interlocks
- Control
- 7 in touchscreen, stored recipes, operator permission levels
- Process Timer
- 1-9999 seconds
- Alarms
- Low vacuum, low gas supply pressure, incorrect process gas
- Vacuum Pump
- Rotary oil vacuum pump (quoted separately)
- System Size
- 706 x 920 x 1415 mm (W x D x H)
- Electrical
- 208–240 VAC, single-phase
Applications
Where PLUTO-30 fits
Batch plasma cleaning
Surface activation
Descum and light etch
Adhesion and bonding preparation
Pilot production
Core facility workflows
Research evidence
Peer-reviewed research
System Views
System Views
Actual PLUTO-30 system photos: the open chamber with its electrode pair, the complete floor-standing unit, an installed cleanroom scene, and chamber dimensions.
FAQ
Frequently Asked Questions
How is PLUTO-30 different from the benchtop PLUTO cleaners?
PLUTO-30 steps up from the benchtop 4-14L cleaners to a 30L floor-standing chamber (1.4 m tall) with insert-rod electrodes, two mass flow controllers, and a 7 in touchscreen with recipe storage. It ships with one electrode pair and takes four at most, so a fully configured machine runs four samples per batch — one per pair.
What processes does PLUTO-30 support?
PLUTO-30 handles plasma cleaning, surface activation, and surface modification, including timed descum and light etch work. It is not a fluorine-based reactive ion etcher: process control is timed, endpoint detection is not included, and the electrode shelves are unheated. MFC-controlled gas distribution lets one system move quickly between recipes and store validated process menus.
Can PLUTO-30 be purchased directly?
PLUTO-30 is configured per application and quoted directly. Share your samples, throughput, and gas chemistry and we will confirm the electrode-pair count, gas lines, and vacuum pump during quote review.
Request a Quote
Scale plasma processing to batch and pilot production with PLUTO-30.
Share your samples, throughput, and gas chemistry for an application-matched configuration.